Molybdenum-oxide (MoO3)films were deposited on glass substrates (Corning #7059 with an area of 26x38 mm(2)) by pulsed laser deposition using an ArF excimer laser. It was found that after annealing at 340 degrees C for 10 min, the film thickness be...
Journal of the Vacuum Society of Japan 51(3) 178-181 2008年 [査読有り]
Approximately 230 nm-thick Al-doped transparent conducting zinc oxide films (AZO) have been deposited on Cyclo Olefin Polymer (COP) substrates with ZnO buffer layer fabricated under oxygen partial pressure of 0.5-5.3 Pa, by pulsed laser deposition...
Approximately 150 nm-thick Al-doped zinc oxide (AZO) films with c-axis orientation have been prepared on glass substrates by pulsed laser deposition (PLD) using a split target divided into AZO(Al2O3 : 1 wt.%) and AZO(Al2...
β-FeSi2 thin films were grown on Si(111) substrates by pulsed laser deposition (PLD) method using Nd: YAG Laser (λ = 1064 nm, laser energy = 50 mJ, laser energy density = 1.65 J/cm2, repetition frequency = 10 Hz). In the fabr...