Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 23(5) 1325-1330 2005年9月 [査読有り]
W O3 films were deposited on the glass substrate (Corning No. 7059 with an area of 26×38 mm) by the pulsed laser deposition method using an ArF excimer laser. It was found that after annealing at 500 °C for 10 min, the film thickness became 1.8 ti...
Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi) 151(2) 40-45 2005年4月 [査読有り]
Al2O3-doped ZnO (AZO) thin films have been deposited onto glass substrates using a split target consisting of AZO (1 wt%) and AZO (2 wt%) by pulsed laser deposition with an ArF excimer laser (λ = 193 nm, 15 mJ, 10 Hz, 0.75 J/cm2). By applying a ma...
Shinku/Journal of the Vacuum Society of Japan 48(3) 169-171 2005年 [査読有り]
ZnO films doped with 1.5 wt% Al2O3 (AZO films) have been deposited, in oxygen with a partial pressure of 0.1 Pa, on glass substrate using a pulsed laser deposition technique with an ArF laser (λ = 193 nm). When as-deposited, a repetition rate of 1...
Shinku/Journal of the Vacuum Society of Japan 48(3) 172-174 2005年 [査読有り]
Approximately 100-nm-thick transparent conducting AZO (ZnO doped with 1.5 wt.% Al2O3) films have been deposited on glass substrates using a pulsed laser deposition method with an ArF excimer laser (λ = 193 nm) and a Nd:YAG laser (λ = 266, 355, 532...
Approximately 150 nm-thick Al-doped zinc oxide (AZO) films with c-axis orientation have been prepared on glass substrates by pulsed laser deposition (PLD) using a split target divided into AZO(Al2O3 : 1 wt.%) and AZO(Al2...
β-FeSi2 thin films were grown on Si(111) substrates by pulsed laser deposition (PLD) method using Nd: YAG Laser (λ = 1064 nm, laser energy = 50 mJ, laser energy density = 1.65 J/cm2, repetition frequency = 10 Hz). In the fabr...
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