Nanthapong Chantaraprachoom, Bingzi Chen, Tatsuhide Hamasaki, Shogo Taniguchi, Tadao Mizuno
第30回年次研究講演会, Nov 25, 2021, 特定非営利活動法人日本オゾン協会
Even though O3/H2O2 based AOP has been proven to be an effective polishing treatment for sewage effluent, some of organic compounds were still found after treatment as the TOC value of treated sample was around 1 mg/L. In pursue of identifying these remaining substances, High Performance HPSEC-OCD was used to determine range of AMW of the remaining substances. In this study, four HPSEC-OCD results were observed and compared: (a) sewage effluent before AOP, (b) after ozone only treatment, (c) after ozonation with hydrogen peroxide addition in the beginning, (d) after ozonation with hydrogen peroxide continuously added. HPSEC-OCD chromatograms show that biopolymer in AMW range of 30,000 Da and LMW neutrals in AMW range of 500 Da were removed in all cases. However, humic substances and building blocks in AMW range of 2,700 and 2,000 Da are only removed in presence of hydrogen peroxide. LMW acids in which has AMW range of 1,100-1,200 Da were found irremovable. Furthermore, concentration in this AMW range increased after all treatment. The increase was hypothesized to be by-products of AOP reactions with larger molecules.